Language: English
免费注册 | 会员中心
深圳专利申请-世纪恒程知识产权
知识产权资讯订阅
当前位置: 首页 > 公告资讯 > 最新公告
最新公告推荐
再涨价!自2018年1月16日起,美国官费部分正式上调

通知日:20171114 实施日:2018116

 

官费上涨的完整项目如下没有列出的项目费用就没有上涨请知悉:

 

提交IDS官费 $180 → $240

提交基因序列表的(新)官费: 300 MB-800 MB$1,000

                             >800 MB: $10,000

 

     PCT-US申请,申请时未及时递交基因序列表产生官费:$300

 

以下费用适应大实体

 

发明专利申请阶段官费:$1600 → $1720 

    独立权利要求超项超过3项官费$460/

权利要求超过20项:$100/

延迟提交声明,发明人签字文件: $160

 

 

临时申请的官费$260 → $280

外观设计申请阶段官费:$760→$980

 

RCE官费:$1200→$1300

      第二次及以后官费$1700→$1900

 

授权费

      发明        $960→$1,000

      外观设计    $560→$700

 

年费:没有变化

 

变更发明人信息$130→$150 

 

优先权期限恢复费:$1700→$2000

 

 

Dear Colleagues,

 

Yesterday the USPTO announced a Final Rule setting new fees, effective January 16, 2018.  The Federal Register publication is attached. A complete list of fees that are changing appears in the tables at pages 22-28 of the attached PDF file (FR pages 52801-52807); any fee not listed there remains unchanged.  Some highlights are provided at the end of this email.

 

Most fees are going up incrementally. The most substantial increases are for AIA trial proceedings (IPR, PGR, CBM), where fees are going up by about $8,000.

 

The IDS fee is increasing for the first time in many years, from $180 to $240.

 

If you file sequence listings, please note the new fees for “Mega” sequence listings: large entity fees $1,000 for 300 MB-800 MB; $10,000 for >800 MB. (The USPTO claims that only about 10 applications a year will be affected.) There is also a new fee of $300 for late furnishing of a sequence listing in a PCT application.

 

As always, we recommend submitting USPTO filings ahead of the fee increase where possible. Our forms will be updated to reflect the new fee amounts starting January 18.

                                                                                                                                     

*********************************************************************************************************

Highlights of 2018 USPTO Fee Changes: All fees below are for large (undiscounted) entity. New fees are listed, with amount of the change noted in parenthesis.

 

* For new utility application: Basic fees $1720 (+$120)

$300 Filing fee (+$20)

            $660 Search fee (+$60)

            $760 Exam fee (+$40)

            $460/claim for >3 independent claims (+$40)

            $100/claim for >20 total claims (+$20)

            $160 surcharge for late declaration/fees/claims/spec (+$20)

 

PCT fees are increasing similarly.

 

* Provisional application: $280 (+$20)

 

* Design and plant applications: fee increase amounts are similar to utility applications, except that the examination fee for design patents jumps to $600 (+$140).

 

* Sequence listing:

New fees for “Mega” sequence listings: $1,000 for 300 MB-800 MB; $10,000 for >800 MB

New fee for late furnishing of a sequence listing in PCT application: $300

 

* RCE        

            - $1300 First request (+$100)

            - $1900 Second & subsequent request (+200)

 

* IDS: $240 (+$60)

 

* Appeal forwarding fee: $2,240 (+$240).  (Notice of Appeal fee of $800 is unchanged.)

 

* Issue fees:

$1,000 Utility (+$40)  

            $700 Design (+$140)

            $800 Plant (+$40)

 

* Maintenance fees: No change.

 

* Certificate of correction: $150 (+$50)

 

* Correcting inventorship or inventor name: $150 (+$20)

 

* Extension of time fee: No change.

 

* Petitions to revive, accept delayed maintenance fee, submit delayed priority claim, etc.:  $2,000 (+$300).  

 

* Ex parte reexamination requests:

Basic fee unchanged at $12,000

New reduced fee for “streamlined” request (40 pages or fewer, subject to formatting requirements): $6,000

 

* AIA trial proceedings (IPR, PGR, CBM):

            $15,500 IPR request fee (+$6,500)

            $15,000 IPR post-institution fee (+$1,00)

            $16,000 PGR/CBM request fee (+$4,000)

            $22,000 PGR/CBM post-institution fee (+$4,00)

 

 

分享到:

 

 

上一篇:世纪恒程代理友讯达赢得“FRIENDCMM”商标撤三申请案
下一篇:发明专利和实用新型专利有哪些区别?
发明专利 实用新型 外观设计